This product is designed to support advanced gas injection functionality for focused ion beam (FIB) systems. The FEI 20089-L Gas Injection System Component (3432 034 01001) enables precise control and delivery of process gases during FIB operations, allowing for applications such as deposition, etching, and material modification. Commonly used in semiconductor, materials science, and nanotechnology environments, this unit ensures reliable integration into compatible FEI FIB systems.
The unit shows normal signs of use and is in great condition. This is a valuable tool for labs or research facilities working with FIB systems. If you have any questions, feel free to ask, and we will be happy to assist.
Benefits:
Precise Gas Injection: Supports controlled gas delivery for FIB applications.
Versatile Functionality: Enables deposition, etching, and surface modification.
Reliable Integration: Designed for compatibility with FEI FIB systems.
Compact and Lab-Ready: Streamlined for installation and efficient operation.
Professional-Grade Build: Manufactured for consistent, dependable performance.
Cleaned and Ready for Handling: Prepared in accordance with manufacturer handling guidelines.
Condition:
This unit is in good condition, showing normal signs of use. The item in the images represents the exact unit you will receive.
What's Included:
Included only is the pictured unit.
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nemesisentpdx - Portland - OR - 503-732-0083 -The item has been cleaned and handled in accordance with the manufacturer's instructions
